Photo process and metrology and
2017-03-01 本文已影响39人
Taofca
名词
COT:coater(涂胶)
EXP:exposure(曝光)
DEV:developer(显影)
REG:registration 、overlay (套刻)
CD:critical dimension (关键尺寸)
INSP:inspection (光学显微镜目检)
RDA:realtime defect analysis (即时缺陷分析)
